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MOCVD Reactor
Physical Vapor Transport of SiC/AlN
Crystal Growth of Semiconductors
Rapid Thermal Processing
Thermal Management
Electro-Magnetic Stabilization
Micro-Systems
NASA Micro-Gravity Processing
Industrial Equipment
Bio-Medical Devices
Biological Systems
Design, Build and Install


Project: Rapid Thermal Processing

Achievement of thermal uniformity in wafers subjected to rapid temperature increase is a challenge for both the hardware design and process control. The two are coupled and must be designed and optimized simultaneously.

In this project, we developed a whole-system model of an RTP furnace, capturing radiative heating by rows of light sources as well as multiple reflective surfaces in the chamber. The developed model was then complemented with a model of the process control algorithm. The complete system was used to analyze a number of lamp arrangements, furnace geometry, and control algorithms to identify the optimal hardware/software combination.